Fundamentals of nanoscale film analysis Terry L. Alford, Leonard C. Feldman and James W. Mayer
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TextLanguage: English Publication details: New York Springer 2007 Description: xiv,336pISBN: 9780387292601Subject(s): FILM ANALYSIS | NANOSCALEDDC classification: 620.3
| Item type | Current library | Call number | Status | Date due | Barcode |
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NISER LIBRARY | 620.3 ALF-F (Browse shelf(Opens below)) | Available | 21309 | |
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NISER LIBRARY | 620.3 ALF-F (Browse shelf(Opens below)) | R (REFERENCE) | 5848 |
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| 620.5, 23 Semiconductor-On-Insulator Materials for Nanoelectronics Applications | 620.5, 23 Fundamentals of Superconducting Nanoelectronics | 620.181 SAH-A Application of fwm and xpm induced by ground-state coherence in thermal atomic vapor | 620.3 ALF-F Fundamentals of nanoscale film analysis | 620.3 AVO-2 2D materials : properties and devices | 620.3 BHU-H Handbook of nanotechnology | 620.3 BHU-S Handbook of nano-techonology |
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