000			00560nam a2200205Ia 4500
008			140908s9999 xx 000 0 und d
020			_a9483540642138
040			_aNISER LIBRARY
041			_aEnglish
082			_a621.382 _bGRA-M
100			_aGraff, K
245			_aMetal impurities in silicon device fabrication _cKlaus Graff
250			_a2nd rev. ed.
260			_aBerlin _bSpringer _c2000
300			_axv,268p.
440			_aSringer series in materials science
500			_aRef sec.
650			_aSILICON DEVICES-METAL IMPURITIES
942			_cBK
999			_c7377 _d7377