Fundamental Aspects of Plasma Chemical Physics
Material type:
Computer fileLanguage: English Publication details: New York, NY Springer New York, Imprint: Springer, 2012. ISBN: 9781441981820, 978-1-4419-8182-0Subject(s): Chemistry, Physical organic | Statistical Physics, Dynamical Systems and Complexity | Physical Chemistry | Physics | Physics | Plasma Physics | Thermodynamics | ThermodynamicsDDC classification: 530.44, Online resources: Click here to access online
| Item type | Current library | Call number | Status | Date due | Barcode |
|---|---|---|---|---|---|
E(electronic)-Books
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NISER LIBRARY | 530.44, 23 (Browse shelf(Opens below)) | Available | E3268 |
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| 530.417, 23 Solid Surfaces, Interfaces and Thin Films | 530.417, 23 Thin Liquid Films | 530.44, 23 Kinetic Theory of the Inner Magnetospheric Plasma | 530.44, 23 Fundamental Aspects of Plasma Chemical Physics | 530.44, 23 Quantum Plasmas | 530.44, 23 Stability and Transport in Magnetic Confinement Systems | 530.44, 23 Laser Wakefield Electron Acceleration |
Physics and Astronomy (Springer-11651)
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